In this paper, some novel micro/nano- moire grating fabricating techniques are introduced. The gratings are produced by the SPM lithography, FIB lithography, and molecular beam epitaxy (MBE) method. The moire patterns formed with these gratings are also introduced. The gratings are successfully to be used to measure the residual deformation in the surface around a step edge of the Al/Si artificial nanocluster with the moire methods. The successful experimental results verify the feasibility of these methods.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.