CONFERENCE PROCEEDINGS
Advanced Search
Dr. Ralf Neubauer
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 1 April 2008 Paper
AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography
Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer
Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806
KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making
Proceedings Article | 20 October 2006 Paper
Image degradation due to phase effects in chromeless phase lithography
Proceedings Volume 6349, 634913 (2006) https://doi.org/10.1117/12.685983
KEYWORDS: Photomasks, Diffraction, Polarization, Etching, Lithography, Semiconducting wafers, Lithographic illumination, Printing, Phase shifts, Electroluminescence
Proceedings Article | 21 March 2006 Paper
Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data
Proceedings Volume 6154, 615448 (2006) https://doi.org/10.1117/12.656222
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Diffraction, Phase shifts, Etching, Cadmium sulfide, Critical dimension metrology, Polarization, Quartz
Proceedings Article | 12 May 2005 Paper
Exploring the 65nm frontier of alternating phase shifting masks with a quartz dry etch chemistry
S. Anderson, R. Neubauer, A. Kumar, I. Ibrahim
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599984
KEYWORDS: Etching, Ions, Reactive ion etching, Photomasks, Quartz, Diffractive optical elements, Polymers, Phase shifting, Dry etching, Plasma
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top