Dr. Ralf Ziebold Profile

Dr. Ralf Ziebold

at Qimonda Dresden GmbH & Co OHG

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 20 October 2006 Paper

Image degradation due to phase effects in chromeless phase lithography

Karsten Bubke, Martin Sczyrba, K. Park, Ralf Neubauer, Rainer Pforr, Jens Reichelt, Ralf Ziebold

Proceedings Volume 6349, 634913 (2006) https://doi.org/10.1117/12.685983

KEYWORDS: Photomasks, Diffraction, Polarization, Etching, Lithography, Semiconducting wafers, Lithographic illumination, Printing, Phase shifts, Electroluminescence

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Proceedings Article | 12 May 2005 Paper

Determination of mask-induced polarization effects occurring in hyper NA immersion lithography

Silvio Teuber, Karsten Bubke, Ingo Hollein, Ralf Ziebold, Jan Peters

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598641

KEYWORDS: Polarization, Photomasks, Diffraction, Diffraction gratings, Binary data, Semiconducting wafers, Phase shifts, Immersion lithography, Manufacturing, Reflection

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Proceedings Article | 28 May 2004 Paper

Method to improve the resolution of contact holes

Gerhard Kunkel, Ralf Ziebold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535246

KEYWORDS: Photomasks, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 14 May 2004 Paper

Methodology and practical application of an ArF resist model calibration

Ralf Ziebold, Bernd Kuchler, Christoph Nolscher, Martin Robiger, Klaus Elian, Bernd Tollkuhn

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536343

KEYWORDS: Calibration, Data modeling, Photomasks, Lithography, 3D modeling, Semiconducting wafers, Optimization (mathematics), Diffractive optical elements, Computer simulations, Diffusion

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Proceedings Article | 17 December 2003 Paper

High-accuracy simulation-based optical proximity correction

Martin Keck, Thomas Henkel, Ralf Ziebold, Christian Crell, Jörg Thiele

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517462

KEYWORDS: Optical proximity correction, Data modeling, Photomasks, Scanning electron microscopy, Printing, Manufacturing, Semiconducting wafers, Critical dimension metrology, Lithography, Data processing

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