Dr. Reiner M. Jungblut Profile

Dr. Reiner M. Jungblut

at ASML Taiwan Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 20 April 2011 Paper

Overlay and focus stability control for 28-nm nodes on immersion scanners

Guo-Tsai Huang, Kai-Hsiung Chen, Li-Jui Chen, Tsai-Sheng Gau, Reiner Jungblut, Albert Chen, Ethan Lee, Lester Wang, Miranda Un, Wei-Shun Tzeng, Jim Chen, Spencer Lin, Jon Wu

Proceedings Volume 7971, 79711M (2011) https://doi.org/10.1117/12.879055

KEYWORDS: Scanners, Semiconducting wafers, Metrology, Overlay metrology, Feedback control, Lithography, Finite element methods, Control systems, Scatterometry, Data modeling

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Proceedings Article | 14 December 2009 Paper

Improving 1D optical proximity effect matching for 45-nm node by scatterometry metrology

Dennis Chang, Reiner Jungblut, Jason Shieh, Alek Chen, Paul Hinnen, Henry Megens, Koen Schreel

Proceedings Volume 7520, 752036 (2009) https://doi.org/10.1117/12.849553

KEYWORDS: Scatterometry, Metrology, Scanners, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Time metrology, Critical dimension metrology, Systems modeling, Lithography

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Proceedings Article | 12 December 2009 Paper

Litho scenario solutions for FinFET SRAM 22nm node

Shih-En Tseng, Shun-Der Wu, Jacques Wang, Jay Kou, Orion Mouraille, Reiner Jungblut, Tsann-Bim Chiou, Jo Finders, Alek Chen, Mircea Dusa, Stephen Hsu

Proceedings Volume 7520, 752025 (2009) https://doi.org/10.1117/12.837495

KEYWORDS: Source mask optimization, Scanners, Photomasks, Reticles, Diffractive optical elements, Double patterning technology, Etching, Lithography, Error analysis

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Proceedings Article | 24 March 2009 Paper

Immersion scanner proximity matching using angle resolving scatterometry metrology

Ren-Jay Kou, Reiner Jungblut, Jan Hauschild, Shih-En Tseng, Jason Shieh, Jim Chen, Alek Chen, Koen Schreel

Proceedings Volume 7272, 727240 (2009) https://doi.org/10.1117/12.816455

KEYWORDS: Scatterometry, Scanners, Metrology, Semiconducting wafers, Optical proximity correction, Systems modeling, Reticles, Lithography, Time metrology, Scatter measurement

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