Dr. Roderick Köhle Profile

Dr. Roderick Köhle

Staff Engineer at Qimonda AG

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 1 April 2008 Paper

Paper

AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer

Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806

KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

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Proceedings Article | 30 October 2007 Paper

Paper

EMF simulations of isolated and periodic 3D photomask patterns

Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Bernd Küchler, Christoph Nölscher

Proceedings Volume 6730, 67301W (2007) https://doi.org/10.1117/12.746392

KEYWORDS: Finite element methods, Photomasks, Computer simulations, Critical dimension metrology, Near field, Chemical elements, Light scattering, Chromium, Optical lithography, Electromagnetism

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Proceedings Article | 18 June 2007 Paper

Paper

3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method

Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Thomas Henkel, Bernd Küchler, Christoph Nölscher

Proceedings Volume 6617, 66170V (2007) https://doi.org/10.1117/12.726236

KEYWORDS: Etching, Diffraction, Finite element methods, Photomasks, Computer simulations, Chemical elements, Electromagnetism, Optical lithography, Nanostructures, Radio propagation

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Proceedings Article | 15 May 2007 Paper

Paper

Rigorous simulation study of mask gratings at conical illumination

Roderick Köhle

Proceedings Volume 6607, 66072Z (2007) https://doi.org/10.1117/12.729018

KEYWORDS: Photomasks, Diffraction, Polarization, Diffraction gratings, Phase shifting, Lithography, Scattering, Transparency, Optical proximity correction, Lithographic illumination

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Proceedings Article | 20 October 2006 Paper

Paper

Rigorous simulation of 3D masks

Sven Burger, Roderick Köhle, Lin Zschiedrich, Hoa Nguyen, Frank Schmidt, Reinhard März, Christoph Nölscher

Proceedings Volume 6349, 63494Z (2006) https://doi.org/10.1117/12.687816

KEYWORDS: Finite element methods, Chemical elements, Photomasks, Computer simulations, Lithography, Image processing, Diffraction, Polarization, Airborne remote sensing, Photoresist processing

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Proceedings Article | 21 March 2006 Paper

Paper

Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data

Martin Sczyrba, Roderick Köhle, Karsten Bubke, Mario Hennig, Rainer Pforr, Ralf Neubauer

Proceedings Volume 6154, 615448 (2006) https://doi.org/10.1117/12.656222

KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Diffraction, Phase shifts, Etching, Cadmium sulfide, Critical dimension metrology, Polarization, Quartz

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Proceedings Article | 20 March 2006 Paper

Paper

Benchmark of numerical versus analytical proximity curve calculations

Roderick Köhle, Christof Bodendorf, Wolfgang Hoppe

Proceedings Volume 6154, 61542Q (2006) https://doi.org/10.1117/12.656884

KEYWORDS: Solids, System on a chip, Computer simulations, Error analysis, Image resolution, Optical proximity correction, Optical simulations, Apodization, Image analysis, Diffraction

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Proceedings Article | 13 March 2006 Paper

Paper

Annotated layout optimization

Jörg Thiele, Roderick Köhle

Proceedings Volume 6156, 615605 (2006) https://doi.org/10.1117/12.656428

KEYWORDS: Optical proximity correction, Critical dimension metrology, Manufacturing, SRAF, Capacitance, Resolution enhancement technologies, Semiconducting wafers, Photomasks, Data processing, Design for manufacturability

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Proceedings Article | 5 November 2005 Paper

Paper

Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation

Sven Burger, Roderick Köhle, Lin Zschiedrich, Weimin Gao, Frank Schmidt, Reinhard März, Christoph Nölscher

Proceedings Volume 5992, 599216 (2005) https://doi.org/10.1117/12.631696

KEYWORDS: Finite element methods, Photomasks, Computer simulations, Diffraction, Finite-difference time-domain method, Polarization, Chemical elements, Solids, Waveguides, Lithography

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Proceedings Article | 28 June 2005 Paper

Paper

Aerial image based mask defect detection in dense array structures

Roderick Kohle, Mario Hennig, Rainer Pforr, Karsten Bubke, Martin Sczyrba, Arndt Durr

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617303

KEYWORDS: Photomasks, Printing, Semiconducting wafers, Inspection, Defect detection, Imaging arrays, Diffraction gratings, Diffraction, Microscopes, Optical filters

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Proceedings Article | 12 May 2005 Paper

Paper

Fast TCC algorithm for the model building of high NA lithography simulation

Roderick Koehle

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599591

KEYWORDS: Raster graphics, Photomasks, Computer simulations, Polarization, Lithography, Imaging systems, Fourier transforms, Convolution, Diffraction, Coherence imaging

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Proceedings Article | 28 May 2004 Paper

Paper

Hard phase-shifting masks for the 65-nm node: a performance comparison

Rainer Pforr, Mario Hennig, Roderick Koehle, Nicolo Morgana, Joerg Thiele, Jens Weckesser

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534091

KEYWORDS: Photomasks, Critical dimension metrology, Phase shifts, Printing, Etching, Lithography, Optical lithography, Chromium, Resolution enhancement technologies, Scanning electron microscopy

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Proceedings Article | 28 May 2004 Paper

Paper

First results from AIMS beta tool for 157-nm lithography

Silvio Teuber, Iwao Higashikawa, Jan-Peter Urbach, Christof Schilz, Roderick Koehle, Axel Zibold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536670

KEYWORDS: Photomasks, Phase shifts, Semiconducting wafers, Optical resolution, Lithography, Etching, Binary data, Wafer-level optics, CCD image sensors, Optical simulations

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Proceedings Article | 28 August 2003 Paper

Paper

Fourier analysis of AIMS images for mask characterization

Roderick Koehle, Wolfgang Dettmann, Martin Verbeek

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504216

KEYWORDS: Photomasks, Fourier transforms, Scanning electron microscopy, Image processing, Phase shifting, Image resolution, Raster graphics, Image analysis, Imaging systems, Sensors

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Proceedings Article | 28 August 2003 Paper

Paper

Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

Wolfgang Dettmann, Jan Heumann, Tanja Hagner, Roderick Koehle, Stephen Rahn, Martin Verbeek, Mardjan Zarrabian, Jens Weckesser, Mario Hennig, Nicolo Morgana

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504202

KEYWORDS: Photomasks, Quartz, Inspection, Phase shifts, Defect inspection, Lithography, Semiconducting wafers, Scanning electron microscopy, Printing, Bridges

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Proceedings Article | 26 June 2003 Paper

Paper

Full-level alternating PSM for sub-100nm DRAM gate patterning

Rainer Pforr, Marco Ahrens, Wolfgang Dettmann, Mario Hennig, Roderick Koehle, Burkhard Ludwig, Nicolo Morgana, Joerg Thiele

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485521

KEYWORDS: Critical dimension metrology, Photomasks, Optical lithography, Lithography, Optical proximity correction, Mask making, Phase shifts, Semiconducting wafers, Etching, Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Paper

Image performance and mask characterization of 157-nm alternating phase-shifting mask

Yung-Tin Chen, Jeff Meute, Kim Dean, David Stark, Christof Schilz, Wolfgang Dettmann, Roderick Koehle, Bettina Schiessl, Wolfgang Degel

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485519

KEYWORDS: Photomasks, Etching, Critical dimension metrology, Semiconducting wafers, Phase shifts, Scanning electron microscopy, Phase measurement, Image processing, Image analysis, Monochromatic aberrations

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Proceedings Article | 1 August 2002 Paper

Paper

Alternating phase-shifting masks: phase determination and impact of quartz defects--theoretical and experimental results

Uwe Griesinger, Wolfgang Dettmann, Mario Hennig, Jan Heumann, Roderick Koehle, Ralf Ludwig, Martin Verbeek, Mardjan Zarrabian

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476982

KEYWORDS: Photomasks, Quartz, Inspection, Semiconducting wafers, Etching, Printing, Phase measurement, Scanning electron microscopy, Phase shifts, Lithography

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Proceedings Article | 14 September 2001 Paper

Paper

Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification

Armin Semmler, Annika Elsner, Roderick Koehle, Leonhard Mader, Rainer Pforr, Christoph Noelscher, Christoph Friedrich, Juergen Knobloch, Uwe Griesinger

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435773

KEYWORDS: Photomasks, Phase shifts, Lithography, Phase shifting, Optical lithography, Optical proximity correction, 3D metrology, Resolution enhancement technologies, 3D image processing, Diffraction

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Proceedings Article | 14 September 2001 Paper

Paper

Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks

Armin Semmler, Leonhard Mader, Annika Elsner, Roderick Koehle, Uwe Griesinger, Christoph Noelscher

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435735

KEYWORDS: Photomasks, Etching, Information operations, Critical dimension metrology, Manufacturing, Phase shifting, Chromium, Phase shifts, Lithography, Optical proximity correction

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Showing 5 of 20 publications

Conference Committee Involvement (2)

Modeling Aspects in Optical Metrology

15 June 2009 | Munich, Germany

Modeling Aspects in Optical Metrology

18 June 2007 | Munich, Germany

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