Mr. Roger C. Sumner Profile

Roger C. Sumner

Optical Engineer

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 12 July 2008 Paper

AO operations at the W. M. Keck Observatory

Randall Campbell, David Le Mignant, Marcos van Dam, Al Conrad, Kenny Grace, Marc Kassis, James Lyke, Hien Tran, Jason Chin, Elizabeth Chock, Steven Doyle, Robert Goodrich, Erik Johansson, Tomas Krasuski, Christine Melcher, Douglas Summers, Roger Sumner, Peter Wizinowich

Proceedings Volume 7016, 701604 (2008) https://doi.org/10.1117/12.790118

KEYWORDS: Adaptive optics, Telescopes, Observatories, Stars, Keck Observatory, Satellites, Laser safety, Safety, Calibration, Space telescopes

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Proceedings Article | 11 July 2008 Paper

Upgrading the Keck AO wavefront controllers

Erik Johansson, Marcos van Dam, Paul Stomski, James Bell, Jason Chin, Roger Sumner, Peter Wizinowich, Roberto Biasi, Mario Andrighettoni, Dietrich Pescoller

Proceedings Volume 7015, 70153E (2008) https://doi.org/10.1117/12.790198

KEYWORDS: Adaptive optics, Stars, Digital signal processing, Wavefronts, Wavefront sensors, Mirrors, Cameras, K band, Sensors, Keck Observatory

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Proceedings Article | 27 June 2006 Paper

Adaptive optics developments at Keck Observatory

Peter Wizinowich, Jason Chin, Erik Johansson, Stephan Kellner, Robert Lafon, David Le Mignant, Chris Neyman, Paul Stomski, Doug Summers, Roger Sumner, Marcos van Dam

Proceedings Volume 6272, 627209 (2006) https://doi.org/10.1117/12.672104

KEYWORDS: Adaptive optics, Wavefronts, Cameras, Telescopes, Wavefront sensors, Keck Observatory, Stars, Imaging systems, Mirrors, Control systems

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Proceedings Article | 14 October 2004 Paper

Image grid errors due to the application of a local heat source on the TIR surface of a prism

Roger Sumner, Shiyu Zhang

Proceedings Volume 5523, (2004) https://doi.org/10.1117/12.560206

KEYWORDS: Prisms, Finite element methods, Data modeling, Error analysis, Temperature metrology, Ray tracing, Thermal effects, Image processing, Aluminum, Superposition

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Proceedings Article | 5 July 2000 Paper

Development of 157-nm small-field and mid-field microsteppers

Ron Miller, Paul Bischoff, Roger Sumner, Stephen Bowler, Warren Flack, Galen Fong

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388998

KEYWORDS: Photoresist materials, Lithography, Photoresist developing, Reticles, Optical lithography, Silica, Objectives, Semiconducting wafers, Lens design, Photomasks

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Showing 5 of 6 publications

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