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Dr. Roie Volkivich
at KLA Israel
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Publications (1)
Proceedings Article | 20 March 2020 Paper
OPO residuals reduction with imaging metrology color per layer mode
Shlomit Katz, Honggoo Lee, Dongyoung Lee, Jinsoo Kim, Jaesun Woo, Chunsoo Kang, Chanha Park, Dohwa Lee, Seongjae Lee, Sanghuck Jeon, Dongsub Choi, Anna Golotsvan, Roie Volkivich, Efi Megged
Proceedings Volume 11325, 113252E (2020) https://doi.org/10.1117/12.2541933
KEYWORDS: Metrology, Overlay metrology, Optical filters, Optical parametric oscillators, 3D metrology, Semiconducting wafers, Near infrared, Photoresist materials, Imaging metrology, Wafer-level optics
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