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Roman Gouk
Member of Technical Staff at Applied Materials Inc
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Author
Publications (4)
Proceedings Article | 17 October 2008 Paper
Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles
Roman Gouk, James Papanu, Fred Li, Jason Jeon, Tong Liu, Rao Yalamanchili
Proceedings Volume 7122, 712211 (2008) https://doi.org/10.1117/12.801549
KEYWORDS: Particles, Cavitation, SRAF, Nondestructive evaluation, Spherical lenses, Photomasks, Mask cleaning, Chemistry, Acoustics, Liquids
Proceedings Article | 19 May 2008 Paper
Advanced damage-free photomask cleaning for 45/32nm technology nodes
Roman Gouk, Jason Jeon, Fred Li, James Papanu, Banqiu Wu, Rao Yalamanchili
Proceedings Volume 7028, 702808 (2008) https://doi.org/10.1117/12.793017
KEYWORDS: Particles, Nondestructive evaluation, Photomasks, Mask cleaning, Chemistry, Chromium, Scanning electron microscopy, Latex, Inspection, Liquids
Proceedings Article | 21 June 2006 Paper
Advanced processes for photomask damage-free cleaning and photoresist removal
James Papanu, Roman Gouk, Han-Wen Chen, Pieter Boelen, Phillip Peters, Michael Belisle, Steven Verhaverbeke, Alexander Ko, Kent Child, Elias Martinez
Proceedings Volume 6281, 62810K (2006) https://doi.org/10.1117/12.692644
KEYWORDS: Chemistry, Particles, Photomasks, Photoresist materials, Reflectivity, Photoresist processing, Chromium, Ozone, Photoresist developing, Attenuators
Proceedings Article | 5 November 2005 Paper
Advanced mask cleaning techniques for sub-100-nm technology nodes
James Papanu, Roman Gouk, Cole Franklin, Han-Wen Chen, Steven Verhaverbeke, Alexander Ko, Kent Child, Pieter Boelen, Suresh Shrauti, Elias Martinez, Brian Brown
Proceedings Volume 5992, 59921G (2005) https://doi.org/10.1117/12.632294
KEYWORDS: Particles, Photomasks, Chemistry, Chromium, Photoresist materials, Mask cleaning, Photoresist processing, Plasma, Phase shifts, Transmittance
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