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Ryo Iikubo
at NuFlare Technology Inc
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Publications (1)
Proceedings Article | 23 March 2020 Paper
Electron beam mask writer EBM-8000P for high throughput mask production
Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu, Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami, Takao Tamura, Kenji Ohtoshi, Hirokazu Yamada
Proceedings Volume 11324, 113241B (2020) https://doi.org/10.1117/12.2552447
KEYWORDS: Photomasks, Electron beams, Critical dimension metrology, Beam shaping
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