Dr. Sabrina Wong Profile

Dr. Sabrina Wong

at DuPont Electronics & Industrial

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Author

Publications (5)

Proceedings Article | 9 April 2024 Paper

Disruptive non-fluorinated photoacid generators using computational chemistry and library design

P. LaBeaume, K. Hernandez, E. Vitaku, T. Marangoni, E. Aqad, M. Li, C. Hoelzel, J. Lachowski, M. Hayes, S. Wong, J. Li, A. Kwok, W. Huang, J. Park, H. He, H. Mackay, C. Liu, J. Cameron, C. Xu, Q. Xie, K. Petrillo

Proceedings Volume 12957, 129572B (2024) https://doi.org/10.1117/12.3025297

KEYWORDS: Photoacid generators, Photoresist materials, Semiconducting wafers, Design, Lithography, Optical lithography, Coating thickness, Chemistry, Coating, Silicon, Sustainability, Extreme ultraviolet lithography

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Proceedings Article | 1 May 2023 Poster + Paper

Metallic contamination reduction in polymer solution using membrane purification technology

Pranesh Muralidhar, Antonio Ramirez, Aiwen Wu, Lawrence Chen, Yamin Liu, Luxi Shen, Robert Blacksmith, Sabrina Wong, Matthew Melanson, Andrey Rudenko

Proceedings Volume 12498, 124981L (2023) https://doi.org/10.1117/12.2657698

KEYWORDS: Metals, Polymers, Tunable filters, Chromium, Contamination, Zinc, Photoresist materials, Iron, Calcium, Aluminum

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Proceedings Article | 13 June 2022 Presentation

Improving wet etch resistance of organic underlayers

Anton Chavez, Iou-Sheng Ke, Sabrina Wong, Shintaro Yamada

Proceedings Volume PC12055, PC1205508 (2022) https://doi.org/10.1117/12.2612350

KEYWORDS: Wet etching, Resistance, Metals, Etching, Tin, Image processing, Titanium, Polymers, Polymer thin films, Plasma

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Proceedings Article | 25 May 2022 Poster + Paper

Removing metallic contaminants from photochemical solvents using advanced purification technologies

Kusum Maharjan, Iou-Sheng Ke, Sabrina Wong, Aiwen Wu, Ying Qi, James Hamzik, Lawrence Chen

Proceedings Volume 12055, 120550V (2022) https://doi.org/10.1117/12.2614308

KEYWORDS: Metals, Iron, Optical lithography, Zinc, Calcium, Sodium, Aluminum, Magnesium, Copper

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Proceedings Article | 22 February 2021 Presentation + Paper

Reducing the absorbance of a high etch resistant spin-on carbon hardmask

Anton Chavez, Iou-Sheng Ke, Sabrina Wong, Curtis Williamson, Li Cui, Paul LaBeaume, Jim Cameron, Shintaro Yamada

Proceedings Volume 11612, 116120F (2021) https://doi.org/10.1117/12.2583630

KEYWORDS: Etching, Absorbance, Carbon, Resistance, System on a chip, Reactive ion etching, Polymers, Image processing, Photoresist materials, Optical lithography

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