Dr. Samuel O'Mullane Profile

Dr. Samuel O'Mullane

Applications Scientist at SUNY Polytechnic Institute

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Publications (5)

SPIE Journal Paper | 21 October 2016

Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations

Samuel O’Mullane, Nick Keller, Alain Diebold

JM3, Vol. 15, Issue 04, 044003, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.044003

KEYWORDS: Finite element methods, Copper, Plasmons, 3D modeling, Plasmonics, Dielectrics, Surface plasmons, Metals, Statistical modeling, Magnetism

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Proceedings Article | 21 April 2016 Paper

Modeling ellipsometric measurement of novel 3D structures with RCWA and FEM simulations

Samuel O'Mullane, Nick Keller, Alain Diebold

Proceedings Volume 9778, 977805 (2016) https://doi.org/10.1117/12.2219270

KEYWORDS: Finite element methods, Plasmons, 3D modeling, Statistical modeling, 3D metrology, Ellipsometry, Copper, Surface plasmons, Thin films, Scatterometry, Critical dimension metrology, Plasmonics, Dielectrics, Chemical elements

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SPIE Journal Paper | 3 August 2015 Open Access

Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Dhairya Dixit, Samuel O’Mullane, Sravan Sunkoju, Abhishek Gottipati, Erik Hosler, Vimal Kamineni, Moshe Preil, Nick Keller, Joseph Race, Gangadhara Raja Muthinti, Alain Diebold

JM3, Vol. 14, Issue 03, 031208, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031208

KEYWORDS: Line edge roughness, Silicon, Scatterometry, Data modeling, Optical components, Scanning electron microscopy, Picosecond phenomena, Chemical elements, Line width roughness, Optical properties

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Proceedings Article | 10 April 2015 Paper

Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry

Dhairya Dixit, Samuel O'Mullane, Sravan Sunkoju, Erik Hosler, Vimal Kamineni, Moshe Preil, Nick Keller, Joseph Race, Gangadhara Raja Muthinti, Alain Diebold

Proceedings Volume 9424, 94242P (2015) https://doi.org/10.1117/12.2185543

KEYWORDS: Line edge roughness, Silicon, Scatterometry, Data modeling, Optical components, Spatial frequencies, Chemical elements, Optical properties, Inverse optics, Critical dimension metrology

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Proceedings Article | 19 March 2015 Paper

Scatterometric analysis of a plasmonic test structure

Samuel O'Mullane, Nick Keller, Joseph Race, Brian Martinick, Alain Diebold

Proceedings Volume 9424, 942411 (2015) https://doi.org/10.1117/12.2085933

KEYWORDS: Plasmonics, Optical proximity correction, Copper, Plasmons, Cadmium, Oxides, Critical dimension metrology, Ellipsometry, Polarization, Optical components

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