Mr. Shad E. Hedges Profile

Shad E. Hedges

at Photronics Inc

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Author

Publications (4)

Proceedings Article | 9 September 2013 Paper

Performance of an automatic algorithm for quantifying critical dimensions in actinic aerial images

Doug Uzzel, Mark Ma, Shad Hedges, Saghir Munir

Proceedings Volume 8880, 88800B (2013) https://doi.org/10.1117/12.2027913

KEYWORDS: Inspection, Cadmium, Photomasks, Reticles, Opacity, Argon, Detection and tracking algorithms, Defect detection, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 30 September 2009 Paper

Critical dimension uniformity using reticle inspection tool

Mark Wylie, Trent Hutchinson, Gang Pan, Thomas Vavul, John Miller, Aditya Dayal, Carl Hess, Mike Green, Shad Hedges, Dan Chalom, Maciej Rudzinski, Craig Wood, Jeff McMurran

Proceedings Volume 7488, 74881O (2009) https://doi.org/10.1117/12.830148

KEYWORDS: Photomasks, Reticles, Scanning electron microscopy, Critical dimension metrology, Inspection, Manufacturing, Etching, Error analysis, Semiconducting wafers, Binary data

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Proceedings Article | 27 May 2009 Paper

Nuisance event reduction using sensitivity control layers (SCL) for advanced photomask inspection

Shad Hedges, Chin Le, Mark Eickhoff, Mark Wylie, Tim Simmons, Venugopal Vellanki, Jeff McMurran

Proceedings Volume 7470, 74700U (2009) https://doi.org/10.1117/12.835192

KEYWORDS: Inspection, Photomasks, Databases, SRAF, Optical proximity correction, Semiconducting wafers, Reticles, Defect detection, Feature extraction, Opacity

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Proceedings Article | 17 October 2008 Paper

Novel mask inspection flow using Sensitivity Control Layers (SCL) on the TeraScanHR-587 platform

Shad Hedges, Chin Le, Mark Eickhoff, Mark Wylie, Tim Simmons, Venu Vellanki, Jeff McMurran

Proceedings Volume 7122, 71221G (2008) https://doi.org/10.1117/12.801480

KEYWORDS: Inspection, Databases, Photomasks, SRAF, Optical proximity correction, Semiconducting wafers, Reticles, Defect detection, Feature extraction, Opacity

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