Mr. Shigeru Hasebe Profile

Shigeru Hasebe

at Toshiba Corp

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 20 May 2006 Paper

Hot spot-based judgment methodology for high-end photomask availability for any exposure tools

Satoshi Usui, Shigeru Hasebe, Shigeki Nojima, Kohji Hashimoto

Proceedings Volume 6283, 62832J (2006) https://doi.org/10.1117/12.681793

KEYWORDS: Photomasks, Neodymium, Lithography, Process engineering, Manufacturing, Semiconductor manufacturing, Semiconductors, Optical lithography, Personal protective equipment, Inspection

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Proceedings Article | 28 August 2003 Paper

Effects of local CD error on lithography performance

Shoji Mimotogi, Shigeki Nojima, Shigeru Hasebe

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504279

KEYWORDS: Photomasks, Line edge roughness, Spatial frequencies, Error analysis, Lithography, Monte Carlo methods, Electroluminescence, Phase shifts, Semiconducting wafers, Reticles

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Proceedings Article | 28 August 2003 Paper

Enhanced flexible mask specifications

Shigeru Hasebe, Shigeki Nojima, Shoji Mimotogi, Satoshi Tanaka, Osamu Ikenaga, Kohji Hashimoto, Soichi Inoue, Ichiro Mori

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504268

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Manufacturing, Semiconducting wafers, Tolerancing, Solids, Semiconductors, 193nm lithography, Semiconductor manufacturing

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Proceedings Article | 27 December 2002 Paper

Flexible mask specifications

Shigeki Nojima, Shoji Mimotogi, Masamitsu Itoh, Osamu Ikenaga, Shigeru Hasebe, Kohji Hashimoto, Soichi Inoue, Mineo Goto, Ichiro Mori

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.469361

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Manufacturing, Tolerancing, Critical dimension metrology, Semiconductors, Solids, Error analysis, Yield improvement

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Proceedings Article | 1 August 2002 Paper

Flexible mask specifications

Shigeki Nojima, Shoji Mimotogi, Masamitsu Itoh, Osamu Ikenaga, Shigeru Hasebe, Kohji Hashimoto, Soichi Inoue, Mineo Goto, Ichiro Mori

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477004

KEYWORDS: Photomasks, Lithography, Manufacturing, Tolerancing, Semiconducting wafers, Critical dimension metrology, Semiconductors, Solids, Error analysis, Transmittance

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Proceedings Article | 29 June 1998 Paper

Accurate proximity correction method with total-process proximity-based correction factor (TCF)

Kohji Hashimoto, Satoshi Usui, Shigeru Hasebe, Masayuki Murota, Takeo Nakayama, Fumitomo Matsuoka, Soichi Inoue, Sachiko Kobayashi, Kazuko Yamamoto

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310752

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Logic devices, Personal protective equipment, Lithography, Optical proximity correction, Semiconductor manufacturing, Fabrication, Distance measurement

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Proceedings Article | 28 July 1997 Paper

Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask

Shoichi Hirooka, Shigeru Hasebe, Tomohiro Tsutsui, Shigeki Nojima, Hisako Aoyama, Hidehiro Watanabe

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277279

KEYWORDS: Opacity, Photomasks, Semiconducting wafers, Transmittance, Chromium, Scanning electron microscopy, Critical dimension metrology, Lithography, Control systems, Glasses

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Showing 5 of 7 publications

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