Dr. Srinath Satyanarayana
Engineering Manager at Intel Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

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