Dr. Steaphan Wallace Profile

Dr. Steaphan Wallace

at ASM

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Publications (1)

Proceedings Article | 12 November 2024 Presentation + Paper

Substantial dose reduction using dry deposited underlayer for EUV lithography while maintaining roughness and minimizing defects

Achintya Kundu, Mihir Gupta, Danilo De Simone, Pieter Vanelderen, Hyo Seon Suh, David De Roest, Dennis Christy, Fatemeh Davodi, Kishan Patel, Steaphan Wallace, Yiting Sun, Yoann Tomczak

Proceedings Volume 13215, 132150M (2024) https://doi.org/10.1117/12.3034575

KEYWORDS: Extreme ultraviolet lithography, Film thickness, Bubbles, Molecular bridges, Line width roughness, Bridges, Silica, Adhesion, Metal oxides, Extreme ultraviolet

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