Dr. Steven J. Spector Profile

Dr. Steven J. Spector

Group Leader at Draper Lab

SPIE Involvement:

Author

Publications (16)

SPIE Journal Paper | 4 January 2022 Open Access

Review of lens-assisted beam steering methods

Steven Spector

JOM, Vol. 2, Issue 01, 011003, (January 2022) https://doi.org/10.1117/12.10.1117/1.JOM.2.1.011003

KEYWORDS: Switches, Waveguides, Microelectromechanical systems, Beam steering, Silicon, Resonators, LIDAR, Mirrors, Optical microsystems, Phased array optics

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Proceedings Article | 7 September 2021 Presentation + Paper

Point source localization with a planar optical phased array compressive sensor

Julian Brown, Steven Spector, Michael Moebius, Lucas Benney, Daniel Vresilovic, Brian Dolle, Alexandra Greenbaum, Alex Huang, Christopher Poulton, Michael Watts, Robin Dawson, Benjamin Lane, J. Laine, Kerri Cahoy, Hannah Clevenson

Proceedings Volume 11815, 118150G (2021) https://doi.org/10.1117/12.2594214

KEYWORDS: Sensors, Imaging systems, Phased array optics, Waveguides, Compressed sensing, Nano optics, Optics, Photonic integrated circuits, Silicon photonics, Infrared imaging

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Proceedings Article | 5 March 2021 Presentation + Paper

An optical phased array for incoherent light imaging applications

Hannah Clevenson, Steven Spector, Lucas Benney, Michael Moebius, Julian Brown, Alva Hare, Alex Huang, Jacqueline Mlnarczyk, Christopher Poulton, Ehsan Hosseini, Michael Watts, Robin Dawson, J. P. Laine, Benjamin Lane

Proceedings Volume 11700, 117002F (2021) https://doi.org/10.1117/12.2587000

KEYWORDS: Phased array optics, Optical imaging, Imaging arrays

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Proceedings Article | 22 April 2016 Paper

WDM laser transmitters for mobile free-space laser communications

D. Caplan, R. Schulein, J. Carney, M. Stevens, S. Spector

Proceedings Volume 9739, 97390W (2016) https://doi.org/10.1117/12.2218297

KEYWORDS: Modulation, Wavelength division multiplexing, Optical filters, Transmitters, Forward error correction, Optical amplifiers, Telecommunications, Frequency shift keying, Binary data, Free space optics

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Proceedings Article | 18 February 2009 Paper

High speed analog-to-digital conversion with silicon photonics

C. Holzwarth, R. Amatya, M. Araghchini, J. Birge, H. Byun, J. Chen, M. Dahlem, N. DiLello, F. Gan, J. Hoyt, E. Ippen, F. Kärtner, A. Khilo, J. Kim, M. Kim, A. Motamedi, J. Orcutt, M. Park, M. Perrott, M. Popovic, R. Ram, H. Smith, G. Zhou, S. Spector, T. Lyszczarz, M. Geis, D. Lennon, J. Yoon, M. Grein, R. Schulein, S. Frolov, A. Hanjani, J. Shmulovich

Proceedings Volume 7220, 72200B (2009) https://doi.org/10.1117/12.808952

KEYWORDS: Silicon, Waveguides, Modulators, Diodes, Electronics, Germanium, Photodiodes, Femtosecond phenomena, Optical filters, Mode locking

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Proceedings Article | 13 February 2008 Paper

Photonic analog-to-digital conversion with electronic-photonic integrated circuits

F. Kärtner, R. Amatya, M. Araghchini, J. Birge, H. Byun, J. Chen, M. Dahlem, N. DiLello, F. Gan, C. Holzwarth, J. Hoyt, E. Ippen, A. Khilo, J. Kim, M. Kim, A. Motamedi, J. Orcutt, M. Park, M. Perrott, M. Popović, R. Ram, H. Smith, G. Zhou, S. Spector, T. Lyszczarz, M. Geis, D. Lennon, J. Yoon, M. Grein, R. Schulein

Proceedings Volume 6898, 689806 (2008) https://doi.org/10.1117/12.767926

KEYWORDS: Silicon, Modulators, Waveguides, Optical filters, Diodes, Germanium, Electronics, Photodetectors, Phase shifts, Photodiodes

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Proceedings Article | 23 March 2007 Paper

Hybrid optical: electron-beam resists

D. Lennon, S. Spector, T. Fedynyshyn, T. Lyszczarz, M. Rothschild, J. Thackeray, K. Spear-Alfonso

Proceedings Volume 6519, 65190H (2007) https://doi.org/10.1117/12.714370

KEYWORDS: Semiconducting wafers, Wafer-level optics, Electron beam lithography, Polymethylmethacrylate, Hybrid optics, Photoresist processing, Lithography, Chemically amplified resists, Head-mounted displays, Photoresist materials

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Proceedings Article | 14 February 2007 Paper

Integrated optical components in silicon for high speed analog-to-digital conversion

S. Spector, T. Lyszczarz, M. Geis, D. Lennon, J. Yoon, M. Grein, R. Schulein, R. Amatya, J. Birge, J. Chen, H. Byun, F. Gan, C. Holzwarth, J. Hoyt, E. Ippen, F. Kärtner, A. Khilo, O. Olubuyide, J. Orcutt, M. Park, M. Perrott, M. Popović, T. Barwicz, M. Dahlem, R. Ram, H. Smith

Proceedings Volume 6477, 64770O (2007) https://doi.org/10.1117/12.705219

KEYWORDS: Silicon, Optical filters, Diodes, Modulators, Waveguides, Electronics, Modulation, Femtosecond phenomena, Resonators, Photodiodes

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SPIE Journal Paper | 1 July 2005

High-frame-rate deep-ultraviolet-optimized charge-coupled device for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high numerical aperture imaging systems

Roderick Kunz, Dennis Rathman, Steven Spector, Michael Rose, Michael Yeung

JM3, Vol. 4, Issue 03, 031105, (July 2005) https://doi.org/10.1117/12.10.1117/1.2032888

KEYWORDS: Polarization, Diodes, Charge-coupled devices, Imaging systems, Photodiodes, Imaging arrays, Photomicroscopy, Silicon, Computer aided design, Silica

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Proceedings Article | 12 May 2005 Paper

A high-frame-rate DUV-optimized CCD for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high NA imaging systems

Roderick Kunz, Dennis Rathman, Steven Spector, Michael Rose, Michael Yeung

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602757

KEYWORDS: Polarization, Charge-coupled devices, Diodes, Imaging systems, Photodiodes, Lithographic illumination, Imaging arrays, Silicon, Computer aided design, Control systems

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Proceedings Article | 26 June 2003 Paper

Monolithic detector array comprised of >1000 aerial image sensing elements

Roderick Kunz, Dennis Rathman, Steven Spector, Michael Yeung

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485414

KEYWORDS: Polarization, Photodiodes, Lithography, Charge-coupled devices, Sensors, Silicon, Diodes, Detector arrays, Diffraction, Electron beam lithography

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Proceedings Article | 30 July 2002 Paper

Attenuating phase-shifting mask at 157 nm

Vladimir Liberman, Mordechai Rothschild, Steven Spector, Keith Krohn, Susan Cann, Stefan Hien

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474603

KEYWORDS: Photomasks, Platinum, Lithography, Phase shifts, Binary data, Metals, Phase shifting, Laser irradiation, Etching, Glasses

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Proceedings Article | 24 July 2002 Paper

Modeling of acid catalyzed resists with electron beam exposure

Theodore Fedynyshyn, Jason Gillman, Russell Goodman, Theodore Lyszczarz, Steven Spector, Donna Lennon, Sandy Denault, Robert Bates

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474190

KEYWORDS: Electron beams, Semiconducting wafers, Optical simulations, Mask making, Silicon, Electron beam lithography, 3D modeling, Lithography, Optical proximity correction, Diffusion

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Proceedings Article | 5 July 2000 Paper

Phase-mask effects by dark-field lithography

Donald White, Raymond Cirelli, Steven Spector, Myrtle Blakey, Obert Wood

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389026

KEYWORDS: Photomasks, Lithography, Reticles, Projection systems, Scanning electron microscopy, Photomicroscopy, Phase shifts, Diffraction gratings, Semiconducting wafers, Resolution enhancement technologies

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Proceedings Article | 25 June 1999 Paper

Development of a technique for rapid at-wavelength inspection of EUV mask blanks

Steven Spector, Ping Luo, Anthony Novembre, Leonidas Ocola, Donald White, Donald Tennant, Obert Wood

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351134

KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Contamination, Photoresist materials, Floods, Multilayers, Semiconducting wafers

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Proceedings Article | 18 December 1998 Paper

Rapid at-wavelength inspection of EUV mask blanks by photoresist transfer

Steven Spector, Donald White, Donald Tennant, Ping Luo, Obert Wood

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332877

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Photomasks, Reflectivity, Inspection, Extreme ultraviolet, Optical inspection, Multilayers, Floods, Photoresist developing

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Showing 5 of 16 publications

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