Dr. Sylvia Pas Profile

Dr. Sylvia Pas

Photomask Technologist

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Publications (3)

Proceedings Article | 28 June 2005 Paper

A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography

Kaustuve Bhattacharyya, Mark Eickhoff, Mark Ma, Sylvia Pas

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617122

KEYWORDS: Photomasks, Reticles, Inspection, Lithography, Semiconducting wafers, Data modeling, Failure analysis, Statistical analysis, 193nm lithography, Crystals

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Proceedings Article | 28 June 2005 Paper

An investigation of a new generation of progressive mask defects on the pattern side of advanced photomasks

Kaustuve Bhattacharyya, Mark Eickhoff, Brian Grenon, Mark Ma, Sylvia Pas

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617083

KEYWORDS: Photomasks, Ions, Inspection, Reticles, Raman spectroscopy, Crystals, Contamination, Chemical analysis, Fluorine, Lithography

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Proceedings Article | 10 May 2005 Paper

An investigation of a new generation of progressive mask defects on the pattern side of advanced photomasks

Kaustuve Bhattacharyya, Mark Eickhoff, Brian Grenon, Mark Ma, Sylvia Pas

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601010

KEYWORDS: Photomasks, Ions, Reticles, Contamination, Inspection, Crystals, Chemical analysis, Fluorine, Air contamination, Manufacturing

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