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Dr. Takashi Obina
at High Energy Accelerator Research Organization KEK
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 26 August 2024 Paper
Research and development of the EUV-FEL light source for lithography
Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yoshinori Tanimoto, Yosuke Honda, Miho Shimada, Masahiro Yamamoto, Takanori Tanikawa, Olga Tanaka, Takashi Obina, Shinichiro Michizono, Hiroshi Kawata
Proceedings Volume 13177, 131770L (2024) https://doi.org/10.1117/12.3033966
KEYWORDS: Free electron lasers, Light sources, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Power consumption, Polarization, Polarization control, Scanners, Tin
Proceedings Article | 13 June 2022 Poster + Presentation
Construction and commissioning of cERL IR-FEL for realizing the EUV-FEL for future lithography
Proceedings Volume PC12051, PC120510S (2022) https://doi.org/10.1117/12.2613617
KEYWORDS: Lithography, Free electron lasers, Extreme ultraviolet, Stochastic processes, Physics, Optical resonators, Machine learning, Light sources, Laser development, Infrared radiation
Proceedings Article | 30 September 2021 Presentation
Demonstration of proof of concept of the EUV-FEL for future lithography
Proceedings Volume 11854, 118540M (2021) https://doi.org/10.1117/12.2600782
KEYWORDS: Free electron lasers, Lithography, Light sources, Extreme ultraviolet, Optical simulations, Laser development, Extreme ultraviolet lithography, Continuous wave operation, Stochastic processes, Scanners
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