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Tetsumasa Takaichi
at Merck Electronics Ltd
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Publications (1)
Proceedings Article | 10 April 2024 Presentation
An alternative EUV photoresist system
Masato Suzuki, Rikio Kozaki, Yida Liu, Tetsumasa Takaichi, Toshiya Okamura, YoungJin Kim, YoungJun Her, Hengpeng Wu, Kun Si, Chenyang Ma, Mark Maturi, Philipp Fackler, Mansour Moinpour, Ralph Dammel, Yi Cao
Proceedings Volume 12957, 129570T (2024) https://doi.org/10.1117/12.3012914
KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Industry, Thermal stability, Process control, Printing, Polymers, Industrial applications, Film thickness
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