CONFERENCE PROCEEDINGS
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Thomas Cardinali
Research & Development Engineer at HP Inc
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Publications (3)
Proceedings Article | 18 March 2009 Open Access Paper
On the integration of memristors with CMOS using nanoimprint lithography
Qiangfei Xia, W. Tong, W. Wu, J. Yang, X. Li, W. Robinett, T. Cardinali, M. Cumbie, J. Ellenson, P. Kuekes, R. S. Williams
Proceedings Volume 7271, 727106 (2009) https://doi.org/10.1117/12.814327
KEYWORDS: Nanoimprint lithography, Electrodes, Metals, Ultraviolet radiation, Reactive ion etching, Switching, Hybrid circuits, Optical lithography, CMOS technology, Nanowires
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Proceedings Article | 27 December 2002 Paper
Enhancement of KRS-XE for 50-keV advanced mask-making applications
Karen Petrillo, David Medeiros, Jim Bucchignano, Marie Angelopoulos, Dario Goldfarb, Wu-Song Huang, Wayne Moreau, Robert Lang, Chester Huang, Christina Deverich, Thomas Cardinali
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468085
KEYWORDS: Photomasks, Mask making, Photoresist materials, Chemically amplified resists, Semiconducting wafers, Polymers, Scanning electron microscopy, Electron beam lithography, Lithography, Oxides
Proceedings Article | 1 August 2002 Paper
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
Christina Deverich, Andrew Watts, Paul Rabidoux, Thomas Cardinali, William Aaskov, Peter Levin, Wu-Song Huang, Wayne Moreau, Marie Angelopoulos, Karen Petrillo, David Madeiros
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476946
KEYWORDS: Photomasks, Etching, Opacity, Critical dimension metrology, Resistance, Chemically amplified resists, Packaging, Lithography, Temperature metrology, Mask making
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