Dr. Thomas C. Roessler Profile

Dr. Thomas C. Roessler

Senior Manager Project Management R&D

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Publications (8)

Proceedings Article | 21 March 2007 Paper

Structural failure prediction using simplified lithography simulation models

P. Niedermaier, T. Roessler

Proceedings Volume 6521, 652107 (2007) https://doi.org/10.1117/12.712054

KEYWORDS: Lithography, Data modeling, Calibration, Optical proximity correction, Printing, Process modeling, Failure analysis, Image analysis, Semiconducting wafers, Solids

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Proceedings Article | 20 October 2006 Paper

Beyond rule-based physical verification

Wolfgang Hoppe, Thomas Roessler, J. Andres Torres

Proceedings Volume 6349, 63494X (2006) https://doi.org/10.1117/12.686604

KEYWORDS: Computer aided design, Manufacturing, Lithography, Visualization, Optical proximity correction, Metals, Distance measurement, Photomasks, Optics manufacturing, Silicon

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Proceedings Article | 20 October 2006 Paper

A generic method for the detection of electrically superfluous layout features

Markus Hofsaess, Thomas Roessler, Eva Nash

Proceedings Volume 6349, 634916 (2006) https://doi.org/10.1117/12.687856

KEYWORDS: SRAF, Photomasks, Optical proximity correction, Transistors, Resolution enhancement technologies, Lithography, Metals, Scanning electron microscopy, Semiconductors, Manufacturing

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Proceedings Article | 14 March 2006 Paper

Call for an industry standard for pattern transfer models for usage in OPC and design for manufacturability

Thomas Roessler, Wolfgang Grimm, Jörg Thiele

Proceedings Volume 6156, 615607 (2006) https://doi.org/10.1117/12.652682

KEYWORDS: Optical proximity correction, Electronic design automation, Design for manufacturing, Product engineering, Standards development, Device simulation, Semiconductors, Design for manufacturability, Manufacturing, Data modeling

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Proceedings Article | 5 May 2005 Paper

Geometrical analysis of product layout as a powerful tool for DFM

Thomas Roessler, Joerg Thiele

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.595062

KEYWORDS: Optical proximity correction, Transistors, Design for manufacturing, Critical dimension metrology, Design for manufacturability, Manufacturing, Logic, Diffusion, Control systems, Resolution enhancement technologies

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Proceedings Article | 27 January 2005 Paper

Lithography yield enhancement through optical rule checking

James Word, J. Andres Torres, Thomas Roessler, Neal Lafferty, Shumay Shang

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577609

KEYWORDS: Printing, Photomasks, Calibration, Lithography, Optical proximity correction, Scanning electron microscopy, Logic, Image processing, Data modeling, Process modeling

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Proceedings Article | 6 December 2004 Paper

Process window modeling using compact models

J. Torres, Thomas Roessler, Yuri Granik

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568354

KEYWORDS: Process modeling, Calibration, Data modeling, Metrology, TCAD, Optical proximity correction, Design for manufacturing, Resolution enhancement technologies, Process control, Photoresist processing

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Proceedings Article | 17 December 2003 Paper

Improvement of empirical OPC model robustness using full-chip aerial image analysis

Thomas Roessler, Beate Frankowsky, Olivier Toublan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518055

KEYWORDS: Optical proximity correction, Product engineering, Data modeling, Model-based design, Artificial intelligence, Image analysis, Printing, Solids, Photomasks, Semiconducting wafers

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Showing 5 of 8 publications

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