Dr. Vasanth Allampalli Profile

Dr. Vasanth Allampalli

at Coventor Inc A Lam Research Co

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 24 March 2017 Presentation + Paper

Investigation of 3D photoresist profile effect in self-aligned patterning through virtual fabrication

Mustafa Akbulut, Jiangjiang Gu, Andras Pap, Vasanth Allampalli, Daniel Faken, Joseph Ervin, Ken Greiner, David Fried

Proceedings Volume 10147, 101470G (2017) https://doi.org/10.1117/12.2258157

KEYWORDS: Photoresist materials, Line edge roughness, Critical dimension metrology, Metals, Optical lithography, Double patterning technology, Capacitance, Photoresist processing, Front end of line, Back end of line, Etching, Transistors

Read Abstract +

SPIE Journal Paper | 13 September 2016

Virtual fabrication using directed self-assembly for process optimization in a 14-nm dynamic random access memory

Mattan Kamon, Mustafa Akbulut, Yiguang Yan, Daniel Faken, Andras Pap, Vasanth Allampalli, Ken Greiner, David Fried

JM3, Vol. 15, Issue 03, 031605, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031605

KEYWORDS: Directed self assembly, Etching, Optical lithography, Process modeling, Capacitors, Device simulation, 3D modeling, Polymers, Virtual reality, Reactive ion etching

Read Abstract +

Proceedings Article | 23 March 2016 Paper

Predicting LER and LWR in SAQP with 3D virtual fabrication

Jiangjiang (Jimmy) Gu, Dalong Zhao, Vasanth Allampalli, Daniel Faken, Ken Greiner, David Fried

Proceedings Volume 9782, 97820N (2016) https://doi.org/10.1117/12.2218929

KEYWORDS: Line edge roughness, Line width roughness, Etching, Lithography, Process modeling, Optical lithography, Back end of line, Deposition processes, Spatial frequencies

Read Abstract +

Proceedings Article | 22 March 2016 Paper

Virtual fabrication using directed self-assembly for process optimization in a 14nm DRAM

Mattan Kamon, Mustafa Akbulut, Yiguang Yan, Daniel Faken, Andras Pap, Vasanth Allampalli, Ken Greiner, David Fried

Proceedings Volume 9777, 977710 (2016) https://doi.org/10.1117/12.2218935

KEYWORDS: Directed self assembly, Process modeling, Optical lithography, Capacitors, Lithography, Optimization (mathematics), Semiconductors, Software development, Interfaces, Transistors, Logic, Etching, Reactive ion etching, Device simulation, 3D modeling, Polymers, Virtual reality

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years