CONFERENCE PROCEEDINGS
Advanced Search
Wei-Yuan Chu
Sr. Application Engineer at KLA Corp
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 26 May 2022 Poster + Paper
Machine learning modeling using process context and exposure data for overlay prediction
W. H. Wang, Irina Brinster, Mohsen Maniat, Fatima Anis, Yen-Hui Lee, Sven Boese, C. F. Tseng, Wei-Yuan Chu, Boris Habets, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen
Proceedings Volume 12053, 120531Q (2022) https://doi.org/10.1117/12.2613202
KEYWORDS: Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Optical parametric oscillators, Performance modeling, Process modeling, Machine learning, Semiconductor manufacturing, Data processing
Proceedings Article | 19 March 2015 Paper
Lithography process controllers and photoresist monitoring by signal response metrology (SRM)
He Rong Yang, Tang Chun Weng, Wei-Jhe Tzai, Chien-Hao Chen, Chun-Chi Yu, Wei-Yuan Chu, Sungchul Yoo, Chien-Jen Huang, Chao-Yu Cheng
Proceedings Volume 9424, 94242C (2015) https://doi.org/10.1117/12.2085271
KEYWORDS: Semiconducting wafers, Photoresist materials, Metrology, Signal processing, Process control, Single crystal X-ray diffraction, Scanners, Critical dimension metrology, Lithography, Data modeling
Proceedings Article | 2 April 2014 Paper
Metrology of advanced N14 process pattern split at lithography
Wei-Jhe Tzai, Chia-Ching Lin, Chien-Hao Chen, Chun Chi Yu, Wei-Yuan Chu, Sungchul Yoo, Chien-Jen Huang, Chao-Yu Cheng, Hsiao-Fei Su
Proceedings Volume 9050, 90502R (2014) https://doi.org/10.1117/12.2046617
KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Overlay metrology, Metrology, Semiconducting wafers, Photomasks, Oxides, Light sources, Etching, Photoresist materials
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top