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Wen-Chi Chen
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (1)
Proceedings Article | 17 December 2003 Paper
Mask-making study for the 65-nm node
Jieh-Jang Chen, Hsin-Chang Lee, Chi-Lun Lu, Ren-Guey Hsieh, Wen-Chi Chen, Hung-Chang Hsieh, Burn-Jeng Lin
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518285
KEYWORDS: Photomasks, Critical dimension metrology, Etching, Optical proximity correction, Mask making, Plasma, Dry etching, Semiconducting wafers, Metrology, Modulation
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