A photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has been specifically engineered to have both a large peak two-photon absorption cross section (δ = 690 x 10-50 cm4 s photon-1 at 705 nm) and a high quantum yield for the photochemical generation of acid (φH+ ≈ 0.5). Under near-infrared laser irradiation, the PAG produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides. The PAG was used in conjunction with the epoxide resist SU-8 for negative-tone three-dimensional microfabrication and was incorporated into a specially formulated chemically amplified resist for positive-tone fabrication of a three-dimensional grating structure. These material systems expand the potential of three-dimensional microfabrication as a tool for manufacturing micro-electromechanical systems, micro-fluidics, and micro-optical structures.
A new photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has a large two-photon absorption cross section that peaks near 705 nm (δ = 690 x 10-50 cm4 s photon-1) and a high quantum yield for the photochemical generation of acid (φH+ ≈ 0.5). Under near-infrared laser irradiation, the molecule produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides at an incident intensity that is one to two orders of magnitude lower than that needed for conventional ultraviolet-sensitive initiators. The new PAG was used in conjunction with the solid epoxide resist Epon SU-8 for negative-tone three-dimensional microfabrication.
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