Dr. Xiaozhe Ma Profile

Dr. Xiaozhe Ma

at Shanghai Institute of Optics and Fine Mechanics

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 26 February 2021

Design and optimization of top-Gaussian illumination field in photolithography

Xiaozhe Ma, Fang Zhang, Zhiyuan Niu, Huijie Huang

OE, Vol. 60, Issue 02, 025106, (February 2021) https://doi.org/10.1117/12.10.1117/1.OE.60.2.025106

KEYWORDS: Optical lithography, Diffusers, Optical engineering, Error analysis, Manufacturing, Quantization, Optical design, Microlens, Pulsed laser operation, Optical components

Read Abstract +

SPIE Journal Paper | 18 March 2020

Telecentricity measurement for exposure system of photolithography tools

Youbao Zhang, Xiaozhe Ma, Fang Zhang, Huijie Huang

OE, Vol. 59, Issue 03, 034109, (March 2020) https://doi.org/10.1117/12.10.1117/1.OE.59.3.034109

KEYWORDS: Semiconducting wafers, Optical lithography, Lithography, Photoresist materials, Optical engineering, Photomasks, Fiber optic illuminators, Sensors, Lithographic illumination, Overlay metrology

Read Abstract +

Proceedings Article | 17 May 2019 Paper

Optimization design of space mirror support based on topology optimization method

Wen Jing Xu, Wei Wang, Yan Jun Qu, Bei Liu, Xu Peng Li, Xiao Zhe Ma

Proceedings Volume 11170, 1117013 (2019) https://doi.org/10.1117/12.2532694

KEYWORDS: Mirrors, Optimization (mathematics), Finite element methods, Mirror structures, Telescopes, Space mirrors, Space telescopes

Read Abstract +

Proceedings Article | 24 July 2018 Paper

An excellent performance optical system for freeform pupil illumination module in immersion photolithography machine

Zongshun Zeng, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Siyu Zhu, Weijie Shi, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082732 (2018) https://doi.org/10.1117/12.2501208

KEYWORDS: Optical lithography, Optical design, Fourier transforms, Device simulation, Resolution enhancement technologies, Micromirrors, Homogenization, Source mask optimization, Lens design, Optical simulations

Read Abstract +

Proceedings Article | 24 July 2018 Paper

Flexible pupil correction technology for photolithography machine

Siyu Zhu, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Zongshun Zeng, Weijie Shi, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082731 (2018) https://doi.org/10.1117/12.2501205

KEYWORDS: Optical lithography, Diffractive optical elements, Device simulation, Lithography, Critical dimension metrology, Optical design, Lithographic illumination, Optoelectronics, Resolution enhancement technologies, Standards development

Read Abstract +

Proceedings Article | 24 July 2018 Paper

Angle position monitoring technology of micro-mirror array for freeform illumination module in immersion lithography

Xiaozhe Ma, Fang Zhang, Zongshun Zeng, Siyu Zhu, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082733 (2018) https://doi.org/10.1117/12.2501223

KEYWORDS: Fourier transforms, Micromirrors, Lithographic illumination, Sensors, Error analysis, Immersion lithography, Reticles, Optical lithography, Source mask optimization, Light scattering

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years