A subwavelength interference nanolithography scheme is numerically demonstrated based on a metallic-insulator-metallic waveguide (MIMW) combined with two symmetrical surface plasmon unidirectional couplers. The unidirectional coupler is composed of a conventional nanoslit with a nanochannel excavated form onside of this nanoslit. Simulation results show that a feature size of 50 nm half-pitch and a depth of 100 nm uniformity pattern can be obtained at the working wavelength of 365 nm with the proposed scheme. This proposed scheme can enhance the intensity of the interference pattern with higher contrast and larger field depth which is advantageous to the fabrication process in practical applications.
A subwavelength interference nanolithography scheme is numerically demonstrated based on a metallic–insulator–metallic waveguide combined with unidirectional couplers. The coupler is a single right-angled (or left-angled) trapezoid metallic nanoslit that can carry out efficient unidirectional generation of surface plasmon polaritons under normal incidence. Simulation results show that a feature size to 50 nm half-pitch uniformity pattern can be obtained at the working wavelength of 365 nm with the proposed scheme. This proposed scheme can enhance the intensity of the interference pattern with higher contrast and field depth and is advantageous for the fabrication process in practical applications.
The visibility of Moiré fringes is a major feature for their application in optical metrology. With the help of surface plasmon polariton (SPP) waves excited for a metal layer whose permittivity match with that of its dielectric partner, the visibility of Moiré fringes is improved. For a dielectric-metal-dielectric sandwich structure between two subwavelength gratings with the optimum thicknesses of the layers but not appropriately matched permittivity, we found that it is easy to achieve a remarkable enhancement (visibility up to 0.88) of the Moiré fringes facilitated by the excitation of SPP waves.
A subwavelength interference lithography method is numerically demonstrated based on surface plasmon polaritons excited by unidirectional couplers, and the unidirectional coupler is composed of a conventional nanoslit with a nanochannel excavated from one side of this nanoslit. Simulation results show that a feature size of 50 nm half-pitch pattern can be obtained at the working wavelength of 365 nm, and this method can enhance the intensity of the interference pattern with higher contrast and field depth and is advantageous to the fabrication process in practical applications.
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