Yannick Rivoira
at CEA-LETI
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12958, 129580K (2024) https://doi.org/10.1117/12.3009969
KEYWORDS: Etching, Plasma etching, Plasma, Climate change, Gases, Transistors, Power consumption, Front end of line, Sustainable technology, CMOS technology

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