Prof. Yasutsugu Usami Profile

Prof. Yasutsugu Usami

at Gigaphoton Inc

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Author

Publications (5)

Proceedings Article | 21 November 2023 Poster + Paper

High-brightness and compact LPP EUV source for inspection system

Yasutsugu Usami, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Takuya Ishii, Tsuyoshi Yamada, Hiroaki Nakarai

Proceedings Volume 12751, 1275116 (2023) https://doi.org/10.1117/12.2686231

KEYWORDS: Extreme ultraviolet, Light sources, Inspection, Tin, Extreme ultraviolet lithography, Metrology, Plasma, Collector mirrors, Pellicles, Laser irradiation

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Proceedings Article | 1 December 2022 Paper

High-power LPP-EUV source for semiconductor HVM: lithography and other applications

Hakaru Mizoguchi, Hiroaki Nakarai, Yasutsugu Usami, Kouji Kakizaki, Junichi Fujimoto, Takashi Saitou

Proceedings Volume 12292, 122920X (2022) https://doi.org/10.1117/12.2657787

KEYWORDS: Extreme ultraviolet, Mirrors, Deep ultraviolet, Lithography, Light sources, Carbon dioxide lasers, Laser systems engineering, Semiconductors, Photomasks, Inspection

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Proceedings Article | 16 November 2018 Presentation + Paper

Laser-induced damage and defect analysis of calcium fluoride window caused by the high pulse repetition rate of ArF excimer laser radiation

Daisuke Tei, Masakazu Hattori, Takahito Kumazaki, Yasutsugu Usami, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 10805, 108050H (2018) https://doi.org/10.1117/12.2326657

KEYWORDS: Excimer lasers, Microscopes, Surface finishing, Crystals, Calcium, Digital image correlation, Atomic force microscopy, Optical components, Laser scattering, Laser induced damage

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Proceedings Article | 3 April 2012 Paper

A study of optical penetration into the micro-periodic structure of semiconductor devices

Harutaka Sekiya, Mitsuhiro Togashi, Mitsunori Numata, Yasutsugu Usami, Suejin Cho, Yongdeok Jeong, Yusin Yang

Proceedings Volume 8324, 83242T (2012) https://doi.org/10.1117/12.916267

KEYWORDS: Refractive index, Transmittance, Dielectrics, Defect detection, Semiconductors, Inspection, Mass attenuation coefficient, Finite-difference time-domain method, Electromagnetic radiation, Electronics

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Proceedings Article | 16 July 2002 Paper

Complementary use of scatterometry and SEM for photoresist profile and CD determination

Yuya Toyoshima, Isao Kawata, Yasutsugu Usami, Yasuhiro Mitsui, Apo Sezginer, Eric Maiken, Kin-Chung Chan, Kenneth Johnson, Dean Yonenaga

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473458

KEYWORDS: Scatterometry, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Scatter measurement, Critical dimension metrology, Process control, Databases, Metrology, Cadmium

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