Mr. Yoichi Minami Profile

Yoichi Minami

President at Litho Tech Japan Corp Ltd

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Author

Publications (7)

Proceedings Article | 3 October 2018 Presentation + Paper

In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiation

Y. Minami, S. Takahashi, H. Minami, Y. Matsumoto, M. Kadoi, A. Sekiguchi, T. Watanabe

Proceedings Volume 10809, 108091W (2018) https://doi.org/10.1117/12.2503255

KEYWORDS: Metals, Extreme ultraviolet, Oxides, Contamination, Nanoparticles, Extreme ultraviolet lithography, Mass spectrometry, Particles

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Proceedings Article | 24 March 2017 Paper

In-situ measurement of outgassing generated from EUV resist including metal oxide nanoparticles during electron irradiation

Seiji Takahashi, Yoichi Minami, Mikio Kadoi, Yoko Matsumoto, Atsushi Sekiguchi, Takeo Watanabe

Proceedings Volume 10143, 1014327 (2017) https://doi.org/10.1117/12.2257939

KEYWORDS: Metals, Oxides, Nanoparticles, Extreme ultraviolet lithography, Mass spectrometry, Analytical research, Zirconium dioxide, Ions, Polymers, Semiconducting wafers, Imaging systems

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Proceedings Article | 12 April 2007 Paper

Study on photochemical analysis system for EUV lithography

A. Sekiguchi, Y. Kono, M. Kadoi, Y. Minami, T. Kozawa, S. Tagawa, D. Gustafson, P. Blackborow

Proceedings Volume 6519, 651946 (2007) https://doi.org/10.1117/12.710516

KEYWORDS: Extreme ultraviolet lithography, Lithography, Light sources, Imaging systems, Semiconducting wafers, Floods, Photoresist processing, Manufacturing, Multilayers, Scanners

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Proceedings Article | 15 March 2007 Paper

Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist

Paul Blackborow, Deborah Gustafson, Donald Smith, Matthew Besen, Stephen Horne, Robert D'Agostino, Youichi Minami, Gregory Denbeaux

Proceedings Volume 6517, 65171W (2007) https://doi.org/10.1117/12.711457

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Electrodes, Plasma, Light sources, Contamination, Floods, Photoresist materials, Metals

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Proceedings Article | 4 May 2005 Paper

Study on the resist materials leaching from resist film during immersion exposure for 193nm using QCM method

Atsushi Sekiguchi, Yoshihisa Sensu, Youichi Minami

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.597003

KEYWORDS: Liquids, Monochromatic aberrations, Immersion lithography, Lithography, 193nm lithography, Semiconducting wafers, Quartz, Optical lithography, Sensors, Semiconductors

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Proceedings Article | 21 May 1996 Paper

Resist metrology for lithography simulation, part I: exposure parameter measurements

Chris Mack, Toshiharu Matsuzawa, Atsushi Sekiguchi, Youichi Minami

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240109

KEYWORDS: Absorption, Photoresist materials, Refraction, Transmittance, Data analysis, Lithography, Semiconducting wafers, Molecules, Quartz, Picture Archiving and Communication System

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Proceedings Article | 21 May 1996 Paper

Resist metrology for lithography simulation, part 2: development parameter measurements

Atsushi Sekiguchi, Chris Mack, Youichi Minami, Toshiharu Matsuzawa

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240120

KEYWORDS: Diffusion, Picture Archiving and Communication System, Photoresist developing, Lithography, Software development, Metrology, Photoresist materials, Scanning electron microscopy, Thin films, Multilayers

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Showing 5 of 7 publications

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