Prof. Yukihiro Fujimura Profile

Prof. Yukihiro Fujimura

Photo-Mask Engineer at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 12 November 2024 Presentation + Paper

Evaluating high-throughput mask systems for mainstream technology applications

Martin Glimtoft, Robert Eklund, Mikael Wahlsten, Mats Rosling, Anders Svensson, Youngjin Park, Yukihiro Fujimura, Izumi Hotei, Mei Ebisawa, Yusuke Shoji, Shingo Yoshikawa

Proceedings Volume 13216, 132160L (2024) https://doi.org/10.1117/12.3034858

KEYWORDS: Photomasks, Deep ultraviolet, Printing, Design, Laser applications, Semiconductors, Industry, Semiconductor lasers, Semiconducting wafers, Scanning electron microscopy

Read Abstract +

Proceedings Article | 10 April 2024 Poster

Exploring the potential of EB lithography in EUV photomask manufacturing

Mei Ebisawa, Tsukasa Abe, Yukihiro Fujimura, Izumi Hotei, Masataka Yamaji, Yasutaka Morikawa, Tatsuya Tomita, Naoya Hayashi, Shingo Yoshikawa

Proceedings Volume PC12953, PC1295313 (2024) https://doi.org/10.1117/12.3013224

KEYWORDS: Extreme ultraviolet, Lithography, Photoresist processing, Photomasks, Manufacturing, High volume manufacturing, Extreme ultraviolet lithography, Semiconductors, Logic, Semiconductor manufacturing

Read Abstract +

Proceedings Article | 22 November 2023 Presentation

Ultimate resolution challenge for high-precision EUV mask by using MBMW technology

Shingo Yoshikawa, Tsukasa Abe, Yukihiro Fujimura, Mei Ebisawa, Izumi Hotei, Issei Sakai, Masataka Yamaji, Yasutaka Morikawa, Tatsuya Tomita, Koji Ichimura, Naoya Hayashi

Proceedings Volume PC12751, PC127510U (2023) https://doi.org/10.1117/12.2688952

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconductor manufacturing, Photomasks, Photomask technology, Manufacturing, Lithography, Electron beams

Read Abstract +

Proceedings Article | 10 May 2016 Paper

Lithographic performance of a new “low-k” mask

Takashi Adachi, Ayako Tani, Yukihiro Fujimura, Katsuya Hayano, Yasutaka Morikawa, Hiroyuki Miyashita, Yukio Inazuki, Yoshio Kawai

Proceedings Volume 9984, 998404 (2016) https://doi.org/10.1117/12.2242870

KEYWORDS: Lithography, Photomasks, Double patterning technology, Semiconducting wafers, Metals, Phase shifts, Optical proximity correction, Silicon, Excimer lasers, Transmittance

Read Abstract +

Proceedings Article | 9 July 2015 Paper

Development of new high transmission eaPSM for Negative Tone Development process on wafer

Takashi Adachi, Ayako Tani, Yukihiro Fujimura, Shingo Yoshikawa, Katsuya Hayano, Yasutaka Morikawa, Yoichi Miura, Hiroyuki Miyashita

Proceedings Volume 9658, 96580P (2015) https://doi.org/10.1117/12.2197611

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Inspection, Transmittance, Excimer lasers, Electroluminescence, Phase shifts, Image processing, Opacity

Read Abstract +

Proceedings Article | 1 November 2007 Paper

Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

Yasuyuki Kushida, Hitoshi Handa, Hiroshi Maruyama, Yuuki Abe, Yukihiro Fujimura, Toshifumi Yokoyama

Proceedings Volume 6730, 673045 (2007) https://doi.org/10.1117/12.751244

KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part II

Yukihiro Fujimura, Jumpei Morimoto, Asuka Manoshiro, Mochihiro Shimizu, Hideyoshi Takamizawa, Masahiro Hashimoto, Hiroshi Shiratori, Katsuhiko Horii, Yasunori Yokoya, Yasushi Ohkubo, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai

Proceedings Volume 6349, 634936 (2006) https://doi.org/10.1117/12.692896

KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: part I

M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai

Proceedings Volume 6349, 63490I (2006) https://doi.org/10.1117/12.693131

KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years