We present recent experiments conducted with our tabletop EUV reflectometer to characterize the detailed geometry, composition, and topography of several nanostructured, polymer-based samples. The EUV measurements are performed without sample damage or any significant sample preparation. Correlative STEM measurements confirm the EUV results, but require extensive sample preparation.
We present a tabletop EUV imaging reflectometer that can characterize the geometry and composition of nanostructures. The setup can be operated in multiple modes — intensity reflectometry, scatter-reflectometry, or imaging reflectometry depending on the length scales and periodicity of the nanostructures present. All these modes of metrology can be performed non-destructively and in a lab-scale setup, using a tabletop high-harmonic coherent EUV source.
As EUV lithography transitions to high volume manufacturing, actinic inspection tools at 13.5 nm wavelength are attractive for understanding the printability of EUV mask defects, as well as for in-fab monitoring for possible defects emerging from extended use. Coherent diffractive imaging (CDI) is a lensless imaging technique that allows for phaseand-amplitude, aberration-free, high-resolution imaging in the EUV. Moreover, sources based on high harmonic generation (HHG) of ultrafast lasers are a proven viable coherent light source for CDI, with flux sufficient for rapid large-area inspection and small-area imaging. By combining CDI and HHG, we implemented actinic EUV photomask inspection on a low-cost tabletop-scale setup. Moreover, we propose and demonstrate a solution to the challenge of ptychographic imaging of periodic structures through careful illumination engineering.
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