Mr. Yuuki Abe Profile

Yuuki Abe

at Dai Nippon Printing Co Ltd

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Author

Publications (2)

Proceedings Article | 1 November 2007 Paper

Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

Yasuyuki Kushida, Hitoshi Handa, Hiroshi Maruyama, Yuuki Abe, Yukihiro Fujimura, Toshifumi Yokoyama

Proceedings Volume 6730, 673045 (2007) https://doi.org/10.1117/12.751244

KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part III

Yuuki Abe, Jumpei Morimoto, Toshifumi Yokoyama, Atsushi Kominato, Yasushi Ohkubo

Proceedings Volume 6349, 634935 (2006) https://doi.org/10.1117/12.692889

KEYWORDS: Etching, Chromium, Anisotropic etching, Quartz, Photomasks, Plasma, Phase shifts, Photoresist processing, Chlorine, Plasma etching

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