Dr. Zelalem Belete
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 1327308 (2024) https://doi.org/10.1117/12.3027941
KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Calibration, Lithography, Critical dimension metrology, Photoresist developing, Computational lithography

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