Dr. Zhaoyu Liu Profile

Dr. Zhaoyu Liu

at ASML

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Proceedings Article | 18 December 2024 Presentation + Paper

Latent damage in high reflectivity dielectric coatings due to 193nm irradiation

Masoud Babaeian, Zhaoyu Liu, Walt Gillespie, Jue Wang, Gerald Cox

Proceedings Volume 13190, 1319008 (2024) https://doi.org/10.1117/12.3031716

KEYWORDS: Reflectivity, Laser irradiation, Dielectrics, Deep ultraviolet, Laser damage threshold, Optical lithography, Mirrors, Speckle, Semiconductors, Semiconductor manufacturing

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193nm Argon Fluoride (ArF) Excimer lasers used for photolithography rely on high reflectivity coated mirrors for beam relay, focusing and pulse stretching. These mirrors must provide high reflectivity at moderate peak fluences (~30 mJ/cm²) for >10¹¹ pulses (typically, >1 year in a normal use case) to provide the performance and reliability that semiconductor manufacturers have come to expect. Generally, high intensity Laser Induced Damage Threshold (LIDT) testing has proven unreliable in evaluating coatings with this kind of long-term durability requirement: typical use-case lifetimes and failure modes do not match LIDT predictions. By carefully controlling fluence and peak intensity, we have succeeded in duplicating use-case failure modes with Accelerated Lifetime Damage Testing (ALDT) in tests lasting ~1-2 weeks. This testing has revealed a latent damage mechanism wherein coatings become vulnerable to thermal and environmental damage only after they have been exposed to a significant accumulation of 193nm irradiation. With this learning, two test protocols have been developed to assess coating robustness. First, a thermal cycling test in which a CO₂ laser is used to periodically heat a coated mirror. Results from this test demonstrate no damage for samples that have not been exposed to DUV, but significant delamination (blistering) on samples pre-exposed to DUV, matching field failure observations. Second, samples that are known to be robust to extended atmospheric exposure are exposed to DUV in a purged environment with no apparent damage for several billion pulses. Subsequently, these samples will develop blisters upon exposure to atmosphere.

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