Commentary: Femtosecond-laser nanolithography for photonic applications

Hiroaki Nishiyama

doi:10.1117/1.3097264

1 February 2009 Commentary: Femtosecond-laser nanolithography for photonic applications

Hiroaki Nishiyama

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Journal of Nanophotonics, Vol. 3, Issue 1, 030301 (February 2009). https://doi.org/10.1117/1.3097264

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This PDF contains the commentary "Femtosecond-laser nanolithography for photonic applications."

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Hiroaki Nishiyama "Commentary: Femtosecond-laser nanolithography for photonic applications," Journal of Nanophotonics 3(1), 030301 (1 February 2009). https://doi.org/10.1117/1.3097264

Published: 1 February 2009

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KEYWORDS

Femtosecond phenomena

Nanolithography

Semiconductors

Absorption

Photonic devices

Photonic nanostructures

Polymers

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