Research Papers

Impacts of tapered sidewall profile on subwavelength grating wideband reflectors

[+] Author Affiliations
Wenxi Yu, Mao Ye

University of Michigan, College of Engineering and Computer Science, Integrated Nano-Optoelectronics Laboratory, 4901 Evergreen Road, Dearborn, Michigan 48128, United States

Ya Sha Yi

University of Michigan, College of Engineering and Computer Science, Integrated Nano-Optoelectronics Laboratory, 4901 Evergreen Road, Dearborn, Michigan 48128, United States

University of Michigan, Energy Institute, 2301 Bonisteel Boulevard, Ann Arbor, Michigan 48109, United States

J. Nanophoton. 9(1), 093058 (Sep 03, 2015). doi:10.1117/1.JNP.9.093058
History: Received June 29, 2015; Accepted July 30, 2015
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Abstract.  We have demonstrated the significant impacts of grating tapered sidewall profile on the subwavelength grating wideband reflector characteristics when taking into account the practical fabrication process. Two different classes of wideband reflectors, referred to as zero-contrast gratings and high-contrast gratings, are numerically investigated in detail and the distinct differences of the impacts due to a grating tapered sidewall are observed. Our works reveal that this tapered sidewall profile plays a critical role in determining the reflection bandwidth, average reflectance, and the band edge. The results could be widely utilized in applications of a variety of nanophotonic devices and their integration, as well as facilitate the design of the fabrication process on how to control the degree of tapered sidewall profile for the integrated subwavelength grating nanophotonic devices.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Wenxi Yu ; Mao Ye and Ya Sha Yi
"Impacts of tapered sidewall profile on subwavelength grating wideband reflectors", J. Nanophoton. 9(1), 093058 (Sep 03, 2015). ; http://dx.doi.org/10.1117/1.JNP.9.093058


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