Joon-Soo Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | 1 November 2021 Open Access
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Peter Buck, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao, Ravi Pai, Sandeep Koranne, Alexander Tritchkov
JM3, Vol. 20, Issue 04, 041403, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041403
KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Semiconducting wafers, Manufacturing, Extreme ultraviolet, Vestigial sideband modulation, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11855, 118550A (2021) https://doi.org/10.1117/12.2599020
KEYWORDS: Particles, Inspection, Photomasks, Digital image processing, Image processing, Sensors, Extreme ultraviolet, Process control, Manufacturing, Plasma

Proceedings Article | 22 February 2021 Presentation + Paper
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Buck Peter, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao
Proceedings Volume 11610, 116100S (2021) https://doi.org/10.1117/12.2587109
KEYWORDS: Optical proximity correction, Mask making, Electronic design automation

Proceedings Article | 15 May 2020 Presentation + Paper
Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi
Proceedings Volume 11323, 113231E (2020) https://doi.org/10.1117/12.2553319
KEYWORDS: Stochastic processes, Photomasks, Data modeling, Nanoimprint lithography, Line width roughness, Calibration, Extreme ultraviolet, Photons, Scanning electron microscopy, Line edge roughness

Proceedings Article | 20 March 2020 Presentation + Paper
Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara
Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246
KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

Showing 5 of 18 publications
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