In this study we examine several innovations. In lithography, we introduce our latest progress on metal oxide resist (MOR) to extend defectivity window, improve photo-speed, and wafer uniformity control by leveraging new resist development techniques.
On the plasma etch front, we focus on plasma-resist interactions and the impact of the pattern transfer process. Gas chemistry and plasma characteristics can modulate resist rectification, leading to a widening of the defectivity window and smoothing of pattern roughness. Especially, when reducing line-space pattern defectivity, correlations between plasma characteristics and microbridge defect numbers point to a proper process regime for patterning in the sub 30nm pitch era.
|