Paper
12 March 1986 Amorphous Silicon Image Pickup Tubes
S. Ishioka, C. Kusano, Y. Takasaki, Y, Shimomoto, T. Hirai
Author Affiliations +
Proceedings Volume 0617, Amorphous Semiconductors for Microelectronics; (1986) https://doi.org/10.1117/12.961080
Event: O-E/LASE'86 Symposium, 1986, Los Angeles, CA, United States
Abstract
Reactively sputtered a-Si:H is used in a photoconductive target of an image pickup tube. When a-Si:H is used for a color imager, high resistivity and wide optical band gap are required. A blocking type target structure is effective in reducing dark current and producing rapid photo response. Low doping of boron into a-Si:H serves to increase both hole and electron mobilities. The imaging tube using this a-Si:H has high photosensitivity, high resolution, and no sticking or burning. By using high velocity electron beam for scanning, lag property is drastically improved.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Ishioka, C. Kusano, Y. Takasaki, Y, Shimomoto, and T. Hirai "Amorphous Silicon Image Pickup Tubes", Proc. SPIE 0617, Amorphous Semiconductors for Microelectronics, (12 March 1986); https://doi.org/10.1117/12.961080
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KEYWORDS
Doping

Boron

Imaging systems

Electron beams

Cameras

Electrodes

Amorphous silicon

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