Excimer Projection Lithography At 193-nm Wavelength

M. Rothschild; D. J. Ehrlich

doi:10.1117/12.968447

1 January 1988 Excimer Projection Lithography At 193-nm Wavelength

M. Rothschild, D. J. Ehrlich

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968447
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Excimer laser projection lithography is expected to become a widely used technique, capable of high throughputs at resolution well below 0.5 μm. In this paper we demonstrate excimer projection patterning with 0.13-μm resolution, and we address issues related to laser engineering and optical materials, which are encountered in the design of practical excimer projection systems.

Citation Download Citation

M. Rothschild and D. J. Ehrlich "Excimer Projection Lithography At 193-nm Wavelength", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968447

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