Paper
14 December 2016 Impedance of (CoFeZr)0,559(PbZrTiO3)0,441 nanocomposite annealed in a tubular furnace
Author Affiliations +
Proceedings Volume 10010, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII; 100101S (2016) https://doi.org/10.1117/12.2243270
Event: Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies 2016, 2016, Constanta, Romania
Abstract
The objective of the present research has been to determine the influence of annealing in tubular furnace on capacity of (CoFeZr)0,559(PbZrTiO3)0,441 nanocomposite produced by ion beam sputtering using combined argon and oxygen beam. The phase angle of the nanocomposite directly after preparing demonstrates negative values, which indicates the capacitive type of electrical conductivity of the material. The rapid increase of conductivity when frequency increases indicates hopping conductance in the material. The additional polarization of the nanocomposite occurs with its extinction in the area of high frequencies. The electrons relaxation time has been defined as of ca τ = 1,25×10-4 s. Annealing of nanocomposite sample x = 55.9 at.% at temperature Ta = 548 K causes phase angle obtains positive values in high frequency area, which indicates the change of conduction type from capacitive to inductive. The voltage resonance phenomenon occurs in the material. Annealing in temperature of Ta = 648 K causes changes of the nanomaterials capacity. The additional oxidization of CoFeZr metallic phase nanograins which provides to the potential barrier formation around potential wells (CoFeZr nanoparticles).
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oleksandr Boiko "Impedance of (CoFeZr)0,559(PbZrTiO3)0,441 nanocomposite annealed in a tubular furnace", Proc. SPIE 10010, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII, 100101S (14 December 2016); https://doi.org/10.1117/12.2243270
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KEYWORDS
Nanocomposites

Annealing

Electrons

Argon

Nanoparticles

Oxygen

Sputter deposition

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