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Here we describe a uniform diameter, direct bandgap Ge1-xSnx alloy nanowires, with a Sn incorporation up to 9%, the fabricated through a conventional catalytic bottom-up growth paradigm employing innovative catalysts and precursors. Optical characterization by means of temperature dependent photoluminescence is used to identify transition point from indirect to direct badgap of GeSn nanowires.
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Dzianis Saladukha, Jessica Doherty, Subhajit Biswas, Tomasz J. Ochalski, Justin D. Holmes, "Optical study of strain-free GeSn nanowires," Proc. SPIE 10108, Silicon Photonics XII, 101081C (20 February 2017); https://doi.org/10.1117/12.2252628