Compact modeling for the negative tone development processes

Fred Kuo; Jason Huang; Lawrence S. Melvin III

doi:10.1117/12.2258057

24 March 2017 Compact modeling for the negative tone development processes

Fred Kuo, Jason Huang, Lawrence S. Melvin III

Proceedings Volume 10147, Optical Microlithography XXX; 101471R (2017) https://doi.org/10.1117/12.2258057
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

When the negative tone development (NTD) process was introduced into photolithography, it brought fidelity improvement with it. However, the NTD process behaves in a manner that is not readily comprehended by the computational techniques used to create high-speed photolithography models for use in the Optical Proximity Correction (OPC) process. These effects are mechanical in nature and are not governed by the diffraction phenomena used to create high speed process models. This study will discuss an attempt to utilize the high speed OPC model methods to deliver an accurate representation of the NTD process. This paper will discuss a compact modeling flow for NTD processes. The flow works to emulate first principle modeling techniques for NTD in an OPC model. This is accomplished through a combination of the new mechanical methods and traditional Dill’s parameters. It also reduces the data volume required to generate the OPC model. The models generated using this method accurately represent NTD SEM image contours. The results will be demonstrated and discussed.

Citation Download Citation

Fred Kuo, Jason Huang, and Lawrence S. Melvin III "Compact modeling for the negative tone development processes", Proc. SPIE 10147, Optical Microlithography XXX, 101471R (24 March 2017); https://doi.org/10.1117/12.2258057

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