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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Advanced Laser Manufacturing Technology, edited by Bingheng Lu, Huaming Wang, Proceedings of SPIE Vol. 10153 (SPIE, Bellingham, WA, 2016) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510607644 ISBN: 9781510607651 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445 SPIE.org Copyright © 2016, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/16/$18.00. Printed in China. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc. Ai, Yong, 12 Cao, Ercong, 0M, 0W Cao, Guohuaa, 08 Chen, De-Ying, 0O, 0P, 0Q Chen, Jian, 0G Chen, Qian, 0M Chen, Shanshan, 0T Chen, Wen, 0X Chen, Wen-jian, 0G Chen, Yang, 12 Chen, Yong, 06 Chen, Yu-dan, 0Y Dong, Shiyun, 17 Dong, Xiaopeng, 0X Duan, Yuan-yuan, 0G Fan, Chang-Kun, 0O, 0P Fan, Guihua, 07 Fan, Youchen, 04 Fan, Yuanyuan, 0C Fan, Zhenfang, 0V Fang, Xiaodong, 0Z Gang, Xiao, 17 Gao, Chunfeng, 13 Gao, Wei, 0G Gao, Xuan-yi, 16, 1A Gong, Lei, 19 Gong, Yanjun, 19 Gou, Ming-Jiang, 09 Gu, Guohua, 0M, 0W Guo, Hai-chao, 16, 1A Guo, Xiao-kang, 16, 1A Guo, Xing, 0M Han, Qingbang, 0H Han, Sen, 0N He, Guangzhong, 0I He, Shi-jie, 16, 1A He, Xingdao, 02 He, Ying-hong, 0L Hu, Hongtao, 0Z Hu, Wen-Gang, 0J Hu, Xiaobo, 0M, 0W Hu, Zhi-yun, 0F Huang, Jianyu, 10, 15 Huang, Xuegong, 0U Huang, Zhonghua, 03 Ji, Fengzhu, 12 Jia, Bing, 08 Jia, Jing, 0H Jin, Guangyong, 01, 0B Kou, Renke, 05 Li, Changjun, 18 Li, Hongye, 0K Li, Huan, 16, 1A Li, Meng, 03 Li, Qi, 0O, 0P, 0Q Li, Qian, 0O, 0Q Li, Ting, 0L Li, Wei, 0I Li, Xin, 0R Li, Yingchun, 04 Li, Yuchen, 0N Liu, Guodong, 0A Liu, Hongyang, 12 Liu, Jie, 0J Liu, Juan, 0R Liu, Liguo, 0I Liu, Linqian, 11 Long, Xingwu, 13 Lu, Qingjie, 0N Lv, Juan, 0L Lv, Qiongyinga, 08 Ma, Jianhui, 0X Ma, Shi-wei, 0G Ma, Xiangfang, 0X Ma, Xiao-long, 0L Ma, Yao, 01, 0B Mo, Qingkai, 0D Pan, Yao, 0V Qian, Rui-hai, 16, 1A Qian, Weixian, 0M, 0W Qian, Xian-mei, 0Y Qu, Tianliang, 0V Ran, Yingying, 0U Ren, Zhong, 0A Shao, Jingzhen, 0Z Shao, Jun, 0F Shen, Zhonghua, 0H Sheng, Xin-Qing, 09 Shi, Lin, 10, 15 Si, Jinhai, 0F Sohiab, Ali, 18 Song, Chaoqun, 17 Song, Xingliang, 0C Sun, Bing, 0K Sun, Hao, 0N Sun, Huayan, 07 Sun, Pei-li, 18 Tang, Yanqin, 0W Tong, Yanqun, 10, 15 Wan, Hongdan, 0K, 11 Wang, Bin, 17 Wang, Chunsheng, 0I Wang, Dongya, 0V Wang, Fang, 0N Wang, Haiyan, 05 Wang, Hongxiao, 0I Wang, Jin, 11 Wang, Kai, 0V Wang, Mengcheng, 14 Wang, Mingjun, 19 Wang, Qi, 13 Wang, Qian, 0C Wang, Quanzhao, 0N Wang, Qun, 13 Wang, Sheng, 0F Wang, Xi, 0Z Wang, Xiaonan, 0X Wang, Yanqing, 04 Wang, Yanyan, 0V Wang, Yongtian, 0R Wang, Zhifei, 0E Wei, Guo, 13 Wu, Dong-Sheng, 0J Wu, Tao, 02 Wu, Xiaoyi, 10, 15 Wu, Xueming, 05 Wuerger, Sophie, 18 Xia, Ruxiao, 02 Xiao, Kaida, 18 Xiong, Zhihua, 0A Xu, Guangming, 0V Xu, Ji, 11 Xu, Xiaobin, 0S, 0T, 0U Xue, Bin, 0L Yan, Shixing, 17 Yan, Xing-tao, 0L Yan, Yining, 0D Yang, Cheng, 0N Yang, Dan, 0R Yang, Fan, 0X Yang, Ming-Lin, 09 Yang, Xiaobo, 12 Yang, Zhe, 0Y Yates, Julian M., 18 Yin, Jian-lin, 0Y Yin, Liuliu, 0N Ying, Jia-Ju, 0J Yu, Huan, 02 Yuan, Boshi, 01, 0B Zeng, Xiao, 0X Zhang, Chu, 0Y Zhang, He, 06, 0S, 0T Zhang, Lin, 0K Zhang, Peng, 0J Zhang, Tao, 0D Zhang, Tinghua, 07 Zhang, Wei, 01, 06 Zhang, Xiangjin, 06 Zhang, Xina, 08 Zhang, Xinyi, 02 Zhang, Yan-mei, 16, 1A Zhang, Yingxi, 0R Zhang, Zuxing, 0K Zhao, Xiaodan, 12 Zhao, Yong-Peng, 0O, 0P, 0Q Zhou, Bing, 0Y Zhou, Jian, 14 Zhou, Wenzhen, 19 Zhou, Yi, 0C, 0O, 0P Zhu, Haohan, 11 IntroductionWe had the great honor of organizing the International Symposium on Advanced Laser Manufacturing Technology 2016. It was truly a great pleasure for us to greet the more than 1000 participants from many different countries who attended the symposium. We firmly believe the symposium will become an important international event in the field of optical technology. The International Symposium on Advanced Laser Manufacturing Technology is sponsored by Chinese Society for Optical Engineering and China High-tech Industrialization Association (CHIA), organized by Chinese Society for Optical Engineering (CSOE), Photoelectronic Technology Committee, Chinese Society of Astronautics, Photo-electronic Industrialization Committee, CHIA, Department of Cooperation and Coordination for Industry, Academe and Research, CHIA. The purpose of the symposium is to provide a forum for the participants to report and review innovative ideas and up-to-date progress and developments, and discuss novel approaches to application in the optical field. It is sincerely hoped that the research and development in optical field will be promoted, and the international cooperation sharing the common interest be enhanced. On behalf of the other co-chairmen, and the Organization Committee of the conference, we would like to heartily thank our sponsors and cooperating organizers for all they have done for the symposium. Thanks also to all the authors for their contributions to the proceedings, to all of the participants and friends for their interest and efforts in helping us to make the symposium possible, to the Program Committee for their effective work and valuable advice, especially the Secretariat, and to the SPIE staff for their tireless efforts and outstanding service in preparing the symposiums and publishing the proceedings. Bingheng Lu Huaming Wang |
