Old and new techniques mixed up into optical photomask measurement method

Jumpei Fukui; Yusaku Tachibana; Makoto Osanai

doi:10.1117/12.2278840

13 July 2017 Old and new techniques mixed up into optical photomask measurement method

Jumpei Fukui, Yusaku Tachibana, Makoto Osanai

Proceedings Volume 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology; 104540W (2017) https://doi.org/10.1117/12.2278840
Event: Photomask Japan 2017, 2017, Yokohama, Japan

Abstract

It has been still highly required for cost efficient solution with easy operation for full-automated CD measurement for line width about 500nm up to 5μm on photomask, because it is frequently use such photomask in the process of manufacturing MEMS sensor for IoT and some devices made in BCD (Bipola CMOS DMOS). As reply to such demand in photomask manufacturing field, we try to take a low noise digital camera technology and LED light source for i-line, which are recently developed, into new measuring tool in order to achieve 1nm (3σ) repeatability for line width measurement between 300nm to 10μm. In addition, for the purpose of full-automated operation, it is very important to find where an initial target line in dense pattern. To achieve such auto line detection precisely, we have improved accuracy of high precision stage (20nm as 3σ) and an alignment algorithm of MEMS Stepper to combine with this tool. As for user-friendly interface, Windows based software helps a lot for not only the operation but also recipe creation or edition in Excel. Actually, in the MEMS manufacturing process, there are various photomasks which need to be check and measure frequently therefore various recipe files are also have to be created and edited frequently.. In order to meet such a requirement in photomask management, we try to make it true by mixing old and new techniques together into one system, which comes to fully automated and cost efficient tool with 1nm repeatability in CD measurement.

Citation Download Citation

Jumpei Fukui, Yusaku Tachibana, and Makoto Osanai "Old and new techniques mixed up into optical photomask measurement method", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540W (13 July 2017); https://doi.org/10.1117/12.2278840

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
5 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Microelectromechanical systems

Optical testing

Image registration

Light emitting diodes

Manufacturing

Digital cameras

Show All Keywords

Keywords/Phrases

Search In:

Publication Years