Dual-mode snapshot interferometric system for on-machine metrology (Conference Presentation)

Xiaobo Tian; Alexander Sohn; Yu Zhang; Oliver Spires; Rongguang Liang

doi:10.1117/12.2518689

13 May 2019 Dual-mode snapshot interferometric system for on-machine metrology (Conference Presentation)

Xiaobo Tian, Alexander Sohn, Yu Zhang, Oliver Spires, Rongguang Liang

Proceedings Volume 10991, Dimensional Optical Metrology and Inspection for Practical Applications VIII; 109910P (2019) https://doi.org/10.1117/12.2518689
Event: SPIE Defense + Commercial Sensing, 2019, Baltimore, MD, United States

Abstract

We present a dual-mode snapshot interferometric system (DMSIS) for measuring both surface shape and surface roughness to meet the urgent need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine.

Conference Presentation

Citation Download Citation

Xiaobo Tian, Alexander Sohn, Yu Zhang, Oliver Spires, and Rongguang Liang "Dual-mode snapshot interferometric system for on-machine metrology (Conference Presentation)", Proc. SPIE 10991, Dimensional Optical Metrology and Inspection for Practical Applications VIII, 109910P (13 May 2019); https://doi.org/10.1117/12.2518689

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