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12 September 2019 Amorphous silicon based multi-level holograms (Conference Presentation)
Haitao Luan, Xi Chen, Min Gu
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Proceedings Volume 11125, ODS 2019: Industrial Optical Devices and Systems; 1112508 (2019) https://doi.org/10.1117/12.2529711
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States
Abstract
The original image has been processed by sampling, calculating and encoding to achieve a-Si based hologram patterns using MATLAB. Through the investigation of the relationship between laser fluences and phase modulations (π), the calculated hologram pattern has been fabricated with femtosecond laser processing. The holographic image is captured using CCD by illuminating the hologram patterns with 561 nm laser beam. The conversion efficiency of 0.82% has been measured using an optical meter.
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Haitao Luan, Xi Chen, and Min Gu "Amorphous silicon based multi-level holograms (Conference Presentation)", Proc. SPIE 11125, ODS 2019: Industrial Optical Devices and Systems, 1112508 (12 September 2019); https://doi.org/10.1117/12.2529711
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KEYWORDS
Holograms
Amorphous silicon
Image processing
Charge-coupled devices
Computer programming
Femtosecond phenomena
Holography
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