Quadriwave lateral shearing phase imaging of EUV masks

Wenhua Zhu; Ryan Miyakawa; Patrick Naulleau

doi:10.1117/12.2574605

16 October 2020 Quadriwave lateral shearing phase imaging of EUV masks

Wenhua Zhu, Ryan Miyakawa, Patrick Naulleau

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170X (2020) https://doi.org/10.1117/12.2574605
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

We present a phase imaging technique for measuring the phase of EUV masks. In this technique we use a Quadriwave Zone Plate (QZP) to superpose four laterally separated copies of the complex amplitude function in the image plane, causing them to interfere onto a detector. By changing the scanning angle, we can control the relative phase between these images, which allows us to extract two orthogonal derivative phases directly, and then subsequently reconstruct the phase of the EUV mask. If the region of interest contains a reference region such as a clear field, the phase can be extracted from the derivative phases directly. Simulations and an experiment are performed to demonstrate the method accuracy.

Conference Presentation

Citation Download Citation

Wenhua Zhu, Ryan Miyakawa, and Patrick Naulleau "Quadriwave lateral shearing phase imaging of EUV masks", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170X (16 October 2020); https://doi.org/10.1117/12.2574605

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available