UHV Aluminum Grazing Incidence Reflectance At Extreme Ultraviolet Wavelengths

Marion L. Scott; Bernard Cameron

doi:10.1117/12.962665

28 July 1989 UHV Aluminum Grazing Incidence Reflectance At Extreme Ultraviolet Wavelengths

Marion L. Scott, Bernard Cameron

Proceedings Volume 1160, X-Ray/EUV Optics for Astronomy and Microscopy; (1989) https://doi.org/10.1117/12.962665
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

We have developed a multi-facet retroreflecting mirror substrate structure which can be coated with a fresh aluminum film in an ultra-high vacuum (UHV) system and subsequently used for in situ reflectance measurements in the extreme ultraviolet (XUV). We utilize a gas discharge XUV source in combination with a 0.2 m Minuteman monochromator to illuminate the 9-facet mirror with a series of XUV wavelengths. The XUV beam is incident on each of the nine facets at 80 degrees (from normal). An imaging microchannel plate detector is utilized to measure both the incident beam and the retroreflected beam in the UHV chamber. Maintenance of an ultra-high vacuum level during the thin film deposition and the subsequent reflectance measurements provides assurance that the fresh aluminum film does not form an oxide surface layer which would adversly affect the XUV reflectance measurements. Results of these reflectance measurements will be discussed.

Citation Download Citation

Marion L. Scott and Bernard Cameron "UHV Aluminum Grazing Incidence Reflectance At Extreme Ultraviolet Wavelengths", Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); https://doi.org/10.1117/12.962665

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